Ahead of SEMICON India 2026, Fujifilm announces ₹800-crore investment in India semiconductor materials plant

Japanese company Fujifilm will invest around ₹800 crore (USD 83 million) to set up a greenfield semiconductor materials manufacturing facility in India, the company said on Wednesday.

The investment will be made in two phases starting October 2026, with the pace of the second phase linked to the development of the semiconductor industry and customer demand in India.

The commercial production is expected to begin in fiscal year 2028.

"Fujifilm ... announced a landmark investment for a new greenfield semiconductor materials manufacturing facility in India. The project will follow a two-phase, staggered investment strategy aligned with industry growth and customer demand, with a total investment of approximately ₹800 crore (around USD 83 million)," the company said in a statement.

Under the first phase, Fujifilm will focus on manufacturing materials for front-end semiconductor processes.

The second phase will cover semiconductor surface conditioning materials and high-purity chemicals, based on the pace of development of the domestic semiconductor industry, it said.

The company said it would work closely with the India Semiconductor Mission (ISM) and seek to utilise government support under the ISM 2.0 policy, which was approved in July 2026.

Fujifilm President and CEO Teiichi Goto on Wednesday called upon Prime Minister Narendra Modi and reaffirmed the company's commitment to contributing to India’s growing semiconductor ecosystem.

The announcement comes as India seeks to build a domestic semiconductor manufacturing ecosystem, including local supply chains for materials and other inputs required by chipmakers.

Fujifilm India had in June signed a memorandum of understanding with the Gujarat State Electronics Mission to explore opportunities for semiconductor materials manufacturing in Gujarat and strengthen domestic supply-chain capabilities.

The company is participating in SEMICON India 2026, being held from September 17-19 at Yashobhoomi in New Delhi, where it is expected to showcase its semiconductor materials portfolio and technologies.

Fujifilm will demonstrate its CMP slurry technology, which it said can achieve polished circuit surface flatness within 0.4 nanometres.

Fujifilm's electronic materials business supplies materials used at different stages of semiconductor manufacturing, including chemical mechanical planarisation (CMP) slurries used to achieve precision planarisation of semiconductor wafers.

"India is entering an important phase in the development of its semiconductor ecosystem, and we see a meaningful opportunity to contribute through the materials technologies, expertise and global capabilities that Fujifilm has built over decades," Koji Wada, Managing Director, FUJIFILM India, recently said.